photomask

photomask

美 　英

• n.光掩模
• 网络光罩；光掩膜；遮光膜

英汉解释

n.

1. 光掩模

例句

These nodes may then be cross mapped from the circuit design onto the chips layout for each of multiple photomask layers within the design.

然后，这些节点从电路设计交互映射到设计中复合光掩模层的每一层芯片布局中。

A novel method and system for photomask manufacturing rule check (MRC) were introduced.

介绍了一种较为先进的光罩可制造性规则检查的方法及其系统构成。

Shown here is a photomask, which bears the patterns that will be printed onto a wafer.

此图显示的就是光掩膜，上面印有将打印到硅晶片上的图案。

In order to repair the clear defects of photomask, photolytic LCVD process is required to initiate the chemical reactions.

为了对透明光掩模亮场区域进行修补，需要光化学解离过程诱导反应发生；

determining effective adhesion of photoresist to hard - surface photomask blanks and semiconductor wafers during etching

测定在蚀刻期间光致抗蚀剂同硬表面光掩膜坯及半导体片的有效粘附性

Test Method for Calibration Verification of Laser Diffraction Particle Sizing Instruments Using Photomask Reticles

用光掩模原版校准检验激光绕射粒子定尺寸仪器的试验方法

Guidelines for photomask defect classification and size definition

光掩模缺陷分类和尺寸定义的准则

Improvement of Development Property of IP Resist on Photomask by Plasma Surface Pretreatment

利用等离子体表面预处理改善光掩模IP胶显影工艺特性

Specification for round quartz photomask substrates

圆形石英玻璃光掩模基板规范

Advanced Photomask Technology Trend and Development

先进光掩膜技术趋势与发展

Sizing issue in the data handling of photomask

光刻版数据处理中的工艺涨缩问题

Pattern automatic placement system for photomask based on FSM model

基于有限状态机模型的光刻版图自动布局系统