ulsi
美 
英
- 网络超大规模集成电路；特大规模集成电路(Ultra Large Scale IC)；甚大规模集成电路(upper large scale integration)
例句
A copper line having self assembled monolayer for use in ULSI semiconductor devices and methods of making the same are presented.
本发明提供用于ULSI半导体器件的具有自组装单分子层的铜线及其制造方法。
Metal silicide films are extensively used as contact meterials in Ultra-large Scale Integrated Circuits (ULSI).
金属硅化物薄膜是广泛应用于超大规模集成电路器件的重要电子材料。
The no-blemish copper deposition in micro trench is the essential problem needing to be resolved in the development of ULSI manufacture.
微细凹槽内无空洞和缝隙缺陷镀铜是集成电路芯片铜布线制造工艺技术发展中需解决的一个关键问题。
In this thesis, we focuse on the microstructure and stress of ULSI Cu interconnects with their impacts on MTF of the electromigration.
本论文主要研究了ULSI中铜互连线的微观结构和应力及其对与电徙动MTF的影响。
Study on Controlling the Concentrations of Dissolved Oxygen and Total Organic Carbon in Water Used for ULSI
控制超大规模集成电路用水中的溶解氧和总有机碳浓度的研究
An Energy Transfer Photochemical Model for the Abatement of Total Organic Carbon in High Purity Water Used in ULSI Fabrication
降低超大规模集成电路用高纯水中总有机碳的能量传递光化学模型
Study and Optimization of CMP Slurry Used to Tantalum Barrier Layer of Copper Interconnection in ULSI
ULSI铜多层布线中钽阻挡层CMP抛光液的研究与优化
Extremely Ultraviolet Lithography Fabrication Technology for Nanometer ULSI Devices
制备纳米级ULSI的极紫外光刻技术
State of the arts Cu interconnect and its reliability in ULSI
ULSI中铜互连及其可靠性的研究与进展
Influence of Interconnection Configuration on Thermal Dissipation of ULSI Interconnect Systems
超大规模集成电路互连系统的布线构造对散热的影响
Theoretical Calculation on the Mechanical Characterization of ULSI Two-Layer Interconnect Films by Surface Acoustic Waves
表面波表征ULSI互连布线双层薄膜机械特性的理论计算
Corrosive Wear Analysis of the Copper Chemical-mechanical Polishing in ULSI Manufacturing
ULSI制造中铜化学机械抛光的腐蚀磨损机理分析
A Novel Analytical Thermal Model for Temperature Estimation of Multilevel ULSI Interconnects
一种新型的集成电路金属连线温度分析解析模型
State-of-the-Art of the On-Chip Copper Interconnect Technology for ULSI's
集成电路片内铜互连技术的发展
Research and Prospects on Copper Chemical Mechanical Polishing in ULSI Manufacturing
ULSI制备中铜布线化学机械抛光技术的研究与展望
Chemical Mechanical Polishing of Silica Dielectric in ULSI Manufacturing
介质的化学机械抛光
RBR control applied on chemical -mechanical polishing process in ULSI manufacturing
RBR控制在超大规模集成电路制造的化学机械抛光工艺中的应用
Technology analysis of wafer chemical mechanical polishing in the manufacture of ULSI
超大规模集成电路制造中硅片化学机械抛光技术分析
Encapsulation of Copper Interconnects in ULSI Using Cobalt Alloys through Electroless Deposition
通过化学镀用钴合金密封ULSI中的铜互连
Analysis and Research of Cleaning Technology for ULSI Silicon Substrate Wafer
ULSI硅衬底片清洗技术的分析研究
Key Technologies for Copper Interconnections in ULSI
ULSI中铜互连线技术的关键工艺
The Engineering Maintenance of ULSI Design Software
超大规模集成电路设计软件的工程化维护
Chemomechanical polishing technique of silicon substrate in ULSI
ULSI硅衬底的化学机械抛光技术
Development and Challenges of Lithography for ULSI
硅集成电路光刻技术的发展与挑战
Study on fluorinated diamond-like carbon films for ULSI
ULSI用氟化类金刚石薄膜的研究
Study on Polishing Slurry for Silicon Substrate in ULSI
超大规模集成电路制备中硅衬底抛光液研究
Development of Diffusion Barrier for Cu Interconnection in ULSI
集成电路Cu互连扩散阻挡层的研究进展
Analysis of Hot Spots in ULSI Interconnect and Via Systems
ULSI中金属互连系统上的热点分析
Diffusion Barrier of Cu Metallization in ULSI
集成电路Cu金属化中的扩散阻挡层
ULSI Ultra Large Scale Integration
超大规模集成
