photolithography
美 [ˌfoʊtoʊlɪ'θɒgrəfɪ] 
英 [ˌfəʊtəlɪ'θɒgrəfɪ]
英汉解释
英英解释
例句
One of the procedures used in making monolithic integrated circuits which overcomes this problem is photolithography based on photoresists.
规程的当中一个被使用在做整体集成电路克服这个问题是石版影印根据光致抗蚀剂。
that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring.
测试晶圆片-影印过程中用于颗粒计算、量溶解度和检测金属污染的晶圆片。
One embodiment of the present invention provides techniques and systems for determining modeling parameters for a photolithography process.
一种用于为光刻工艺确定参数的方法，所述方法包括：接收布局；
Transmission phase gratings with continuous relief structures are fabricated with one step direct laser writing grayscale photolithography.
利用一步激光直写灰阶光刻方法制作了具有连续浮雕结构的透射式相位光栅。
The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division.
无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。
Contact-mode photolithography was used for realizing the monolithic integration of 0.
采用光学接触式光刻方式，实现了单片集成0。
Alignment Precision - Displacement of patterns that occurs during the photolithography process.
套准精度-在光刻工艺中转移图形的精度。
The principle for eliminating the diffraction error of photolithography with lens array is demonstrated by optical transfer function method.
用光学传递函数方法说明了透镜阵列消除光刻中衍射误差的原理。
Influences of side-wall slope of photolithography pattern on characteristic dimensions after ion implantation are analyzed.
分析了光刻图形侧墙斜坡对离子注入后图形特征尺寸的影响。
A first photolithography process forms first and second diffusion trench openings for the first and second diffusion regions.
第一光刻工艺为第一和第二扩散区形成了第一和第二扩散沟槽开口。
Methods: Master stamps for soft lithography were produced using photolithography .
方法：主模版采用光刻方法制备，使用硅作为基片。
First, consider the advantages and disadvantages of photolithography.
首先，想想光蚀刻法的优点跟缺点。
The microchannels were firstly constructed on a glass substrate by standard UV photolithography and wet etching technique.
首先，采用紫外光刻和化学湿法刻蚀技术在玻璃基片上加工微米深度的微通道；
The patterned anodic aluminum oxide (AAO) template was fabricated by UV-photolithography.
采用紫外光刻法制得图案化的阳极氧化铝模板。
Photolithography: forming electrodes in the form required on the ITO film.
光刻：在ITO表面形成要求形状的电极。
The second photolithography process is carried out independent of the first photolithography process.
所述第二光刻工艺的执行独立于所述第一光刻工艺。
Implementation Methods for Amplitude Division Maskless Laser Interference Photolithography
振幅分割无掩模激光干涉光刻的实现方法
Photolithography Process Simulation for Integrated Circuits and Microelectromechanical System Fabrication
集成电路和微电子机械系统加工过程中的光刻工艺模拟
Design and construction of an ultrahigh vacuum evaporation equipment for atom photolithography
原子光刻用超高真空蒸发设备的设计和建立
Application of Semiconductor Photolithography in Biochip Fabrication
半导体光刻技术在生物芯片制作中的应用
Optical proximity correction for improving pattern quality in submicron photolithography
光学邻近校正改善亚微米光刻图形质量
Implementation Methods for Wave-Front Division in Maskless Laser Interference Photolithography
波前分割无掩模激光干涉光刻的实现方法
New Filtering Approach on Partial Coherent Imaging System for Improving Photolithography Resolution
部分相干分数域滤波改善光刻分辨率新方法
Fabricating High Performance Diffractive Microlens by Single Step Photolithography and Wet Etching
采用单步光刻和湿法腐蚀工艺制作高性能衍射微透镜
Experimental Study on Pupil Filtering Projection Photolithography
光瞳滤波投影光刻实验研究
Improving the edge profiles of lithography patterns using gray-tone technique in digital photolithography
用灰度曝光技术改善数字光刻图形轮廓
Laser Interference Photolithography for Fabricating Periodic Patterns in Large Area
用于大面积周期性图形制造的激光干涉光刻
Application of Simulation Technology in the Dispatching of Photolithography Area in Wafer Fabrication
仿真技术在晶圆制造光刻区派工中的应用
A Study on Improving Imaging Resolution of Projection Photolithography with Pupil Filtering
光瞳滤波提高投影光刻成像分辨力研究
More complex photolithography operations for deep-submicron designs
深亚微米下的越趋复杂的光刻操作
Photolithography Using Super-Resolution Near Field Structure
超分辨近场结构光刻技术
Recent Progress in Photolithography Technology
光刻技术及其新进展
Auto-controlled Liquid Crystal Light Valve Arrays as Photolithography Shutter
自控液晶光阀组式光刻快门研究
Simulation of Solidification Process of Micro Stereo Photolithography
微光成型法实体模型固化过程的仿真
Analysis of nanometrology and atom photolithography
纳米计量与原子光刻技术分析
Precompensation for Nonlinear Distortion in Thick Film Photolithography
厚胶光刻非线性畸变的校正
Research of Mask Division for Improving the Edge Sharpness of Photolithography
掩模分形提高光刻边缘锐度的研究
The Attenuated Phase-Shifting Mask for KrF Excimer Laser Photolithography
用于KrF准分子激光光刻的衰减相移掩模
The Application of photolithography in Indium Bump Fabrication
光刻技术在铟柱制备工艺中的应用研究
The simulation analysis for photolithography process of microlens array
微透镜列阵光刻工艺过程的模拟与分析
